FOTURAN® II
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Technical Details of FOTURAN® II

Leading science, engineering and technology brands have known that FOTURAN® is a highly versatile and reliable photo-structurable glass-ceramic for more than 30 years. SCHOTT has developed FOTURAN® II, a material that improves on the same formula to offer an even higher standard for photo-sensitive glass wafers.

Homogenous, versatile and precise

High optical transmission, excellent photosensitivity

In a process similar to the melting method used in the production of optical glass, continuous melting achieves an outstandingly high uniformity for FOTURAN® II. It also shows over 90 % transmission (in a substrate of 1 mm thickness) between 350 nm and 2.700 nm.

Thickness and surface quality tailored to your needs

FOTURAN® II features a low TTV, low roughness and a low degree of defect, as well as a highly adaptable size and shape. In addition, a range of thicknesses and customized specifications are available for specific customer requirements.

Simple structuring with standard equipment

FOTURAN® II facilitates the straightforward production of wafer structures via semiconductor standard procedures, such as UV exposure, heat treatment and wet etching, without the need for photo-resist. With a wide process window for each step, it is a reliably compatible material to use with standard semiconductor equipment.

High precision and homogeneity in structure tolerance

One of several advantages of structures made on FOTURAN® II wafer glass is their high homogeneity of photosensitivity. This is due to the advanced procedures SCHOTT has honed over many years, similar to the lithography process in the semiconductor fabrication process.
Available products
Structuring process and characteristics

Available products

SCHOTT FOTURAN® II is available as:

  • Polished substrates and wafers

 

To find out more, please see the related products on the overview page.


Structuring process and characteristics

Working principle

FOTURAN® II is a photo-structurable glass-ceramic and structured in three steps – Ceramization as a 4th step is optional

Illustrations of the four steps of the FOTURAN® II structuring process

1) Different temperature profiles during crystallization lead to different crystal structures

 

Standard photostructuring process

FOTURAN® II structuring consists of UV exposure, heat-treatment and etching - subsequent ceramization is optional

Diagram showing the four stages of FOTURAN® II structuring

1) For 0.5 mm thick substrates – Parameter for other thicknesses may differ

2) Optimal theoretical exposure wavelength is 312 nm

 

Transmission curve of unprocessed FOTURAN® II

The highest UV-sensitivity of raw FOTURAN® II is between 290 & 330 nm - Visible in the change of transmission slope

Graph showing the transmission curve of SCHOTT FOTURAN® II glass

Want to know more? Let’s talk

Whether you need more information, samples, a quote, or advice for a project, we would be delighted to talk to you.

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