Forschungsberichte 2002-2005



Neue Materialien



Boccaccini, A.R.; Liebald, R.; Beier, W.; Chawla, K.K.
Fabrication, mechanical properties and thermal stability of a novel glass matrix composite material reinforced by short oxycarbide fibres
Journal of Materials Science 37. 2002, p. 4379-4384
Grabosch, G.; Parthier, L.; Krüll, P.; Knapp, K.
Strong improvement of critical parameters of CaF2 lens blanks for 193nm and 157nm lithography
Optical Microlithography XVII / Smith, B.W., ed., Bellingham, WA: SPIE, 2004, p. 1781-1786. - (Proceedings of the SPIE ; 5377)


Hahn, J.; Grabosch, G.; Parthier, L.; Knapp, K.
Critical enabling properties of CaF2 lens blanks for state of the art lithography tools
Optical Microlithography XVI / Yen, A., ed., Bellingham, WA: SPIE, 2003, p. 734-741. - (Proceedings of the SPIE ; 5040)


Heil, H.; Andress, G.; Schmechel, R.; von Seggern, H.; Steiger, J.; Bonrad, K.; Sprengard, R.
Sunlight stability of organic light-emitting diodes
Reprinted with permission from: Journal of Applied Physics 97. 2005 (12), article no. 124501. Copyright 2005, American Institute of Physics


Hertel, D.; Vin Soh, E.; Bässler, H.E.; Rothberg, L.J.
Electric field dependent generation of geminate electron-hole pairs in a ladder-type π-conjugated polymer probed by fluorescence quenching and delayed field collection of charge carriers
Chemical Physics Letters 361. 2002, p. 99-105
Kim, M.; Zhao, Y.-J.; Freeman, A.J.; Mannstadt, W.
Screened-exchange determination of the optical properties of large gap insulators: CaF2
Reprinted with permission from: Applied Physics Letters 84. 2004 (18), p. 3579-3581. Copyright 2004, American Institute of Physics


Knapp, K.
In search of calcium fluoride - manufacturers face new production challenges as they attempt to meet rising need
Photonics Spectra 37. 2003 (5), p. 58-60
Koster, H.; Branz, K.; Dietze, U.; Dreß, P.; Heß, G.
Novel acid-free cleaning process for mask blanks
12. International Symposium on Photomask und Next-Generation Lithography Mask Technology / Komuro, M., ed., Bellingham, WA: SPIE, 2005, p. 493-500. - (Proceedings of the SPIE ; 5853)


Krüger-Velthusen, E.; Friemel, F.; Aschke, L.; Lenzen, F.
Cleaning of low thermal expansion materials for low defect EUVL mask substrates
18. European Conference on Mask Technology for Integrated Circuits and Microcomponents / Behringer, U.FW., ed., Bellingham, WA: SPIE ; 2002, p. 38-40. - (Proceedings of the SPIE ; 4764)


Letz, M.
Calciumfluorid für die UV-Lithographie - Optische Anisotropie in Kristallen mit kubischer Symmetrie - wie ein Effekt aus der Grundlagenforschung industrierelevant wird
Physik-Journal 3. 2004 (2), p. 43-47
Letz, M.; Engel, A.; Mannstadt, W.; Parthier, L.; Natura, U.; Knapp, K.
CaF2 for DUV lens fabrication: Basic material properties and dynamic light-matter interaction
Optical Microlithography XVII / Smith, B.W., ed., Bellingham, WA: SPIE, 2004, p. 1797-1804. - (Proceedings of the SPIE ; 5377)


Letz, M.; Gottwald, A.; Richter, M.; Brinkmann, M.; Wehrhan, G.; Parthier, L.
On the optical anisotropy in the cubic crystal of CaF2: Scaling arguments and their relation to dispersing absorption
Optical Microlithography XVI / Yen, A., ed., Bellingham, WA: SPIE, 2003, p. 662-666. - (Proceedings of the SPIE ; 5040)


Letz, M.; Mannstadt, W.; Brinkmann, M.; Mörsen, E.
Spatial dispersion in CaF2 caused by the vicinity of an excitonic bound state
Optical Microlithography XV / Yen, A., ed., Bellingham, WA: SPIE, 2002, p. 1761-1768. - (Proceedings of the SPIE ; 4691)


Letz, M.; Mannstadt, W.; Brinkmann, M.; Parthier, L.; Wehrhan, G.; Mörsen, E.
Short wavelength optical anisotropy in CaF2 caused by exciton dispersion
Publication of a contribution to Journal of Microlithography, Microfabrication, and Microsystems 2. 2003 (2), p. 112-118, by courtesy of SPIE


Letz, M.; Parthier, L.; Gottwald, A.; Richter, M.
Spatial anisotropy of the exciton level in CaF2 at 11.1 eV and its relation to the weak optical anisotropy at 157 nm
Physical Review B 67. 2003 (233101:1-3)
Linow, S.; Schneider, C.; Geiss, S.; Janicka, J.; Hassel, E.P.; Rüdiger, F.
Experimental study of the synthesis of fused silica by direct combustion hydrolysis
Publication of a contribution to Analytical and Bioanalytical Chemistry 374. 2002 (5), p. 772-777, by courtesy of Springer Berlin / Heidelberg


Molchanov, A.; Friedrich, J.; Wehrhan, G.; Müller, G.
Study of the oxygen incorporation during growth of large CaF2-crystals
Journal of Crystal Growth 273. 2005 (3-4), p. 629-637
Molchanov, A.; Hilburger,U.; Friedrich, J.; Finkbeiner, M.; Wehrhan, G.; Müller, G.
Experimental verification of the numerical model for a CaF2 crystal growth process
Crystal Research and Technology 37. 2002 (1), p. 77-82
Mühlig, C.; Kufert, S.; Triebel, W.; Coriand, F.
Simultaneous measurement of bulk absorption and fluorescence in fused silica upon ArF laser irradiation
Advanced Characterization Techniques for Optical Semiconductor and Data Storage Components / Duparré, A.; Singh, B., eds., Bellingham, WA: SPIE, 2002, p. 107-116. - (Proceedings of the SPIE ; 4779)


Mühlig, C.; Kufert, S.; Triebel, W.; Coriand, F.; Natura, U.
Measuring small bulk absorption coefficients of fused silica at 193 nm by laser induced deflection (LID)
Publication of a contribution to Glastechn. Ber. Glass Sci. Technol. 75 C2 (2002) p. 362-365 (7. International Otto Schott Colloquium, July 7-11, 2002; proceedings / ed. by C. Rüssel; G. Völksch, Frankfurt/M.: Verl. d. Deutschen Glastechnischen Gesellschaft, 2002) by courtesy of the Deutsche Glastechnische Gesellschaft (DGG)


Mund, D.; Leib, J.
Novel microstructuring technology for glass on silicon and glass-substrates
Copyright © [2004] IEEE. Reprinted from 54. Electronic Components and Technology Conference, Las Vegas, NV, Feb 03, 2004 / New York: IEEE, 2004, p. 939-943


Natura, U.; Martin, R.; von der Gönna, G.; Kahlke, M.; Fasold, G.
Kinetics of laser induced changes of characteristic optical properties in Lithosil® with 193nm excimer laser exposure
Optical Microlithography XVIII, parts 1-3, San Jose, CA, Mar 01-04, 2005 / Smith, B.W., ed., Bellingham, WA: SPIE, 205, p. 1312-1319. - (Proceedings of the SPIE ; 5754)


Natura, U.; Sohr, O.; Letz, M.; Martin, R.; Kahlke, M.; Fasold, G.
Excimer laser induced defect generation in Lithosil
Optical Microlithography XVII / Smith, B.W., ed., Bellingham, WA: SPIE, 2004, p. 1708-1714. - (Proceedings of the SPIE ; 5377)


Natura, U.; Sohr, O.; Martin, R.; Kahlke, M.; Fasold, G.
Mechanisms of radiation induced defect generation in fused silica
Laser Induced Damage in Optical Materials / Exarhos, G.J.; Guenther, A.H.; Kaiser, N., ... , eds., Bellingham, WA: SPIE, 2003, p. 155-164. - (Proceedings of the SPIE ; 5273)


Seitz, H.; Sobel, F.; Renno, M.; Leutbecher, T.; Olschewski, N.; Reichardt, T.; Walter, R.; Becker, H.; Buttgereit, U.; Heß, G.; Knapp, K.; Wies, C.; Lebert, R.
Production challenges of making EUV mask blanks
EMLC 2005: 21. European Mask and Lithography Conference / Behringer, U.F. W., ed., Bellingham, WA: SPIE, 2005, p. 244-251. - (Proceedings of the SPIE ; 5835)


Seitz, H.; Sobel, F.; Renno, M.; Leutbecher, T.; Olschewski, N.; Reichardt, T.; Walter, R.; Becker, H.; Buttgereit, U.; Heß, G.; Knapp, K.; Wies, C.; Lebert, R.
Recent results on EUV mask blank multilayers and absorbers
Emerging Lithographic Technologies IX, parts 1 and 2, San Jose, CA, Mar 01-03, 2005 / Mackay, R.S., ed., Bellingham, WA: SPIE, 2005, p. 190-199. - (Proceedings of the SPIE ; 5751)


Sobel, F.; Aschke, L.; Becker, H.; Renno, M.; Rüggeberg, F.; Kirchner, S.; Leutbecher, T.; Olschewski, N.; Schiffler, M.; Walter, K.; Heß, G.; Buttgereit, U.; Knapp, K.; Lebert, R.; Juschkin, L.; Wies, C.; Jägle, B.
Update on the EUVL mask blank activity at Schott LITHOTEC
23. Annual BACUS Symposium on Photomask Technology / Kimmel, K.R.; Staud, W., eds., Bellingham, WA: SPIE, 2003, p. 1259-1270. - (Proceedings ot the SPIE ; 5256)


Voges, F.; Bonrad, K.; Däubler, T.K.; Frank, T.; Pommerehne, J.; O.; Sprengard, R.
Organic Light Emitting Diodes (OLED) for lighting applications - recent advances and perspectives of commercialisation
Light Sources 2004 : Institute of Physics Conference Series 182. 2004, p. 183-185


Yang, X.; Neher, D.; Hertel, D.; Däubler, T.K.
Highly efficient single-layer polymer electrophosphorescent devices
Advanced Materials 16. 2004 (2), p. 161-166
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