Forschungsberichte 2002-2005



Funktionsschichten



Bauer, S.; Klippe, L.; Rothhaar, U.; Kuhr, M.
Optical multilayers for ultra-narrow bandpass filters fabricated by PICVD
Thin Solid Films 442. 2003 (1-2), p. 189-193
Bauer, S.; Weber, U.; Rothhaar, U.; Römer-Scheuermann, G.; Kuhr, M.; Fiedler, M.; Lohmeyer, M.
High performance wear resistant coatings on plastics
48. Annual Society of Vacuum Coaters Technical Conference, April 23-28, 2005, Adam's Mark Denver Hotel, Denver, CO; proceedings / Society of Vacuum Coaters, Albuquerque, NM: SVC, 2005, p. 359-364. - (Proceedings of the Annual Technical Conference - Society of Vacuum Coaters ; 48)
Becker, H.; Aschke, L.; Schubert, B.; Krieger, J.; Lenzen, F.; Yulin, S.; Feigl, T.; Kuhlmann, T.; Kaiser, N.
Ion beam sputter deposition of low defect EUV mask blanks on 6 inch LTEM substrates in a real production environment
Emerging Lithographic Technologies VI / Engelstad, R.L., ed., Bellingham, WA: SPIE, 2002, p. 503-508. - (Proceedings of the SPIE ; 4688)


Becker, H.; Chey, J.; Sobel, F.; Schmidt, F.; Renno, M.; Buttgereit, U.; Angelopoulos, M.; Heß, G.; Knapp, K.
Development of a new PSM film system for 157 nm extensible to high transmission 193 nm lithography
23. Annual BACUS Symposium on Photomask Technology / Kimmel, K.R.; Staud, W., eds., Bellingham, WA: SPIE, 2003, p. 204-212. - (Proceedings ot the SPIE ; 5256)


Becker, H.; Schley, P.; Schmidt, F.; Sobel, F.; Renno, M.; Olschewski, N.; Seitz, H.; Buttgereit, U.; Knapp, K.; Heß, G.
New solutions for inspection contrast tuning, enhanced chemical durability and a new ultra high transmission PSM
24. Annual BACUS Symposium on Photomask Technology / Staud, W.; Weed, J.T., eds., Bellingham, WA: SPIE, 2004, p. 659-668. - (Proceedings of the SPIE ; 5567)


Becker, H.; Schmidt, F.; Sobel, F.; Renno, M.; Buttgereit, U.; Chey, J.; Angelopoulos, M.; Knapp, K.; Heß, G.
Performance data on new tunable attenuating PSM for 193nm and 157nm lithography
Photomask and Next Generation Lithography Mask Technology XI / Tanabe, H., ed., Bellingham, WA: SPIE, 2004, p. 542-549. - (Proceedings of the SPIE ; 5446)


Becker, H.; Sobel, F.; Aschke, L.; Renno, M.; Krieger, J.; Buttgereit, U.; Heß, G.; Lenzen, F.; Knapp, K.; Yulin, S.; Feigl, T.; Kuhlmann, T.; Kaiser, N.
High-performance 6-inch EUV mask blanks produced under real production conditions by ion beam sputter deposition
22. Annual BACUS Symposium on Photomask Technology / Grenon, B.J.; Kimmel, K.R., eds., Bellingham, WA: SPIE, 2002, p. 389-399. - (Proceedings of the SPIE ; 4889)


Hormes, R.
Beschichtung von Borosilikatglas zur Verbesserung der chemischen Stabilität von Glasbehältern
Pharmazeutische Industrie/pharmind 65. 2003 (9a, Sonderh., Behälter-Produktion), p. 951-955, by courtesy of ECV - Editio Cantor Verlag


Kuhr, M.; Bauer, S.; Rothhaar, U.; Wolff, D.
Coatings on plastics with the PICVD technology
Thin Solid Films 442. 2003 (1-2), p. 107-116
Reinig, M.
Coated plastics for light weight and longevity
Materials World 11. 2003 (5), p. 13-15
Rupertus, V.
Surface and thin film analysis - indispensable tool for coating development and
-production

Materialwissenschaft und Werkstofftechnik 33. 2002 (11), p. 651-656
Sobel, F.; Aschke, L.; Renno, M.; Seitz, H.; Becker, H.; Olschewski, N.; Reichardt, T.; Heß, G.; Buttgereit, U.; Knapp, K.; Letzkus, F.; Butschke, J.; Koepernik, C.
Absorber stack optimization towards EUV lithography mask blank pilot production
24. Annual BACUS Symposium on Photomask Technology / Staud, W.; Weed, J.T., eds., Bellingham, WA: SPIE, 2004, p. 781-790. - (Proceedings of the SPIE ; 5567)


Sobel, F.; Aschke, L.; Rüggeberg, F.; Seitz, H.; Olschewski, N.; Reichardt, T.; Becker, H.; Renno, M.; Kirchner, S.; Leutbecher, T.; Heß, G.; Knapp, K.
Production of low thermal expansion EUVL mask blanks with low defect multilayer buffet and absorber
Emerging Lithographic Technologies VIII / Mackay, R.S., ed., Bellingham, WA: SPIE, 2004, p. 242-253. - (Proceedings of the SPIE ; 5374)


Thelen, A.; Tilsch, M.; Tikhonravov, M.K.; Trubetskov, M.K.; Brauneck, U.
Topical meeting on Optical Interference Coatings (OIC '2001): design contest results
Applied Optics 41. 2002 (16), p. 3022-3038
Völklein, F.; Meier, A.; Schreder, B.; Liebald, R.; Woywod, T.; Pawlowski, E.
Novel techniques for micropatterning of glasses
Publication of a contribution to Glastechn. Ber. Glass Sci. Technol. 78 C (2005) p. 148-156 (Symposium on Novel Optical Technologies, Würzburg, May 24-25, 2005 / ed. by J. Deubener, U. Fotheringham, W. Pannhorst, E. Pawlowski, U. Roger, L. Wondraczek, Offenbach.: Verl. d. Deutschen Glastechnischen Gesellschaft, 2005) by courtesy of the Deutsche Glastechnische Gesellschaft (DGG)


Walther, M.; Rupertus, V.; Seemann, C.; Brecht, J.; Hormes, R.; Swift, R.W.
Pharmaceutical vials with extremely high chemical inertness
PDA Journal of Pharmaceutical Science and Technology 56. 2002 (3), p. 124-129
Zhong, D.; Moore, J.J.; Mishra, B.M.; Ohno, T.; Levashov, E.A.; Disam, J.
Composition and oxidation resistance of Ti-B-C and Ti-B-C-N coatings deposited by magnetron sputtering
Surface and Coatings Technology 163-164. 2003, p. 50-56
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