High-tech optical materials from Jena
Over the years, German and other European companies have gained important expertise in this technology. This is particularly true of SCHOTT LITHOTEC AG in Jena. “We are the only supplier worldwide that offers the full spectrum of high-tech optical materials for current and future applications in lithography,” says Dr. Martin Heming, CEO and Chairman of the Executive Board of SCHOTT LITHOTEC AG. This includes special glasses for shortwave blue light, synthetic quartz glass and synthetic calcium fluoride crystals. And especially in today’s 193-nm and next-generation 157-nm technology for high-performance wafer steppers, SCHOTT LITHOTEC is the leading research and production company offering the necessary optical materials and the corresponding components and systems.
SCHOTT’s subsidiary is gaining more and more international recognition for these achievements. “SCHOTT LITHOTEC is a supplier of growing importance for us and the entire semiconductor industry. This is particularly true for the continued realization of Moore’s Law, which means the imaging of increasingly smaller structures that require light sources for 157 nm, resulting in a greater demand for calcium fluoride crystals in lens production,” stresses David Skinner, vice president of sales at Cymer Inc.’s Lithography Systems Solutions Unit in San Diego, California. The U.S.-based company is the world’s leading producer of excimer light sources integrated into wafer steppers, and they have recently intensified their cooperation with SCHOTT LITHOTEC.
“Our leading position in illumination sources is also due to the fact that we rely on a small group of particularly important suppliers who meet our quality requirements and work with modern processes. SCHOTT LITHOTEC definitely belongs to this circle of key suppliers,” says Skinner, full of praise for the German partner. Cymer recently introduced its innovative Master Oscillator Power Amplifier (MOPA) technology. A paradigm shift from current lithography technology, MOPA will enable next-generation light sources to deliver higher power, tighter bandwidths and lower operation costs for future optical lithography applications across all three deep ultraviolet (DUV) wavelengths – 248 nm, 193 nm and 157 nm. The first product in its new XL Series of performance-driven light sources for advanced lithography – the XLA 100, a 193-nm light source – was announced in July 2002. In addition to the introduction of this product, Cymer also announced that it received a volume purchase agreement with a value in excess of $130 million for the XLA 100, and the customer has agreed to take delivery of the light sources covered under the agreement from introduction through the year 2004.
EUVL – a radical change in technology
Focusing on zeroexpansion materials
As part of a technology transfer project, SCHOTT LITHOTEC AG and the Fraunhofer Institute for Applied Optics and Fine Mechanics (IOF) in Jena have succeeded for the first time ever in developing a technology to produce highly reflective and flawless coatings for EUV mask blanks on an industrial scale. In this successful collaboration with Fraunhofer’s scientists, SCHOTT LITHOTEC came up with a process in just five months that complies with today’s highest international standards. “With this development we have further strengthened the position of our Business Unit Components and verified our intention to become one of the world’s leading suppliers of photomask blanks,” says CEO Martin Heming enthusiastically. With a reflective capability of 64.6 percent from a 6” EUV mask blank that is free of imperfections, the Mo/Si coating system now already meets the requirements of the semiconductor industry that have been predicted for the years to come.